Silicene Growth on Insulating Ultra-Thin Film of NaCl

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dc.contributor.advisorAbdallah El KENZ
dc.contributor.authorKhalid Quertite
dc.date.accessioned2025-04-15T08:37:04Z
dc.date.accessioned2026-01-24T08:36:48Z
dc.date.available2025-04-15T08:37:04Z
dc.date.issued2018
dc.description.collaboratorAbdelilah Benyoussef
dc.description.collaboratorHaik Jamgotchian
dc.description.collaboratorMimouna Baitoul
dc.description.collaboratorNicolas Trcera
dc.description.collaboratorDidier Ribat
dc.identifier.urihttps://toubkal.imist.ma/handle/123456789/36578
dc.identifier.urihttps://doi.org/10.83129/toubkal-14769
dc.language.isoFR
dc.publisherFaculté des Sciences de Rabat
dc.subjectSilicenefr_FR
dc.subjectXPSfr_FR
dc.subjectSTM
dc.subjectAESfr_FR
dc.subjectPhysique des matériaux
dc.subjectLEEDfr_FR
dc.subject.otherPhysique
dc.subject.specificMatière condensée et Modélisation des systèmes
dc.titleSilicene Growth on Insulating Ultra-Thin Film of NaClfr_FR

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